Time Schedule:
Karl F. Bohringer
E E 527
Seattle Campus
Principles and techniques for the fabrication of microelectronics devices and integrated circuits. Includes clean room laboratory practices and chemical safety, photolithography, wet and dry etching, oxidation and diffusion, metallization and dielectric deposition, compressed gas systems, vacuum systems, thermal processing systems, plasma systems, and metrology. Extensive laboratory with limited enrollment. Prerequisite: graduate standing and permission of instructor.
Class description
The course will cover the foundations and hands-on practices of microfabrication in a cleanroom environment.
Student learning goals
Know the basic design and operation principles of a microfabrication cleanroom.
Be familiar with hazards and safety procedures in a cleanroom.
Be able to perform basic microfabrication prodedures such as photolithography, thin film deposition, wet etching, and surface characterization.
Understand the design of various cleanroom equipment.
General method of instruction
The course consists of 3 one-hour lectures and 1 three-hour laboratory session per week.
Recommended preparation
Physics and chemistry; basic knowledge of semiconductor principles.
Class assignments and grading
Bi-weekly quizzes will test the material covered in class and in reading assignments, including in particular laboratory safety issues.
Grades are assigned based on correctness and completeness of answers to quiz questions (50%) and on performance in the course project (50%).
