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Instructor Class Description

Time Schedule:

Karl F. Bohringer
E E 527
Seattle Campus


Principles and techniques for the fabrication of microelectronics devices and integrated circuits. Includes clean room laboratory practices and chemical safety, photolithography, wet and dry etching, oxidation and diffusion, metallization and dielectric deposition, compressed gas systems, vacuum systems, thermal processing systems, plasma systems, and metrology. Extensive laboratory with limited enrollment. Prerequisite: graduate standing and permission of instructor.

Class description

The course will cover the foundations and hands-on practices of microfabrication in a cleanroom environment.

Student learning goals

Know the basic design and operation principles of a microfabrication cleanroom.

Be familiar with hazards and safety procedures in a cleanroom.

Be able to perform basic microfabrication prodedures such as photolithography, thin film deposition, wet etching, and surface characterization.

Understand the design of various cleanroom equipment.

General method of instruction

The course consists of 3 one-hour lectures and 1 three-hour laboratory session per week.

Recommended preparation

Physics and chemistry; basic knowledge of semiconductor principles.

Class assignments and grading

Bi-weekly quizzes will test the material covered in class and in reading assignments, including in particular laboratory safety issues.

Grades are assigned based on correctness and completeness of answers to quiz questions (50%) and on performance in the course project (50%).

The information above is intended to be helpful in choosing courses. Because the instructor may further develop his/her plans for this course, its characteristics are subject to change without notice. In most cases, the official course syllabus will be distributed on the first day of class.
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Last Update by Karl F. Bohringer
Date: 03/25/2007