Time Schedule:
Karl F. Bohringer
E E 527
Seattle Campus
Principles and laboratory techniques used in solid-state electronics research. Basic familiarity with practices and equipment used on-campus. Laboratory safety; materials handling, storage and disposal; clean room use; photoresist characteristics; mounting, bonding, and probing; wet chemical etching; vacuum evaporation; patterning of metal films using photoresist. Extensive laboratory with limited enrollment. Prerequisite: graduate standing and permission of instructor.
Class description
The course will cover the foundations and hands-on practices of microfabrication in a cleanroom environment.
Student learning goals
Know the basic design and operation principles of a microfabrication cleanroom.
Be familiar with hazards and safety procedures in a cleanroom.
Be able to perform basic microfabrication prodedures such as photolithography, thin film deposition, wet etching, and surface characterization.
Understand the design of various cleanroom equipment.
General method of instruction
The course consists of 3 one-hour lectures and 1 three-hour laboratory session per week.
Recommended preparation
Physics and chemistry; basic knowledge of semiconductor principles.
Class assignments and grading
Bi-weekly quizzes will test the material covered in class and in reading assignments, including in particular laboratory safety issues.
Grades are assigned based on correctness and completeness of answers to quiz questions (50%) and on performance in the course project (50%).
